Towards Atomic Scale Quantum Dots in Silicon: An Ultra-Efficient and Robust Subtractor using Proposed P-shaped Pattern

dc.authorscopusid58718414700
dc.authorscopusid55411379000
dc.authorscopusid59125628000
dc.authorscopusid26422242900
dc.contributor.authorRasmi,H.
dc.contributor.authorMosleh,M.
dc.contributor.authorNavimipour,N.J.
dc.contributor.authorKheyrandish,M.
dc.date.accessioned2024-06-23T21:39:28Z
dc.date.available2024-06-23T21:39:28Z
dc.date.issued2024
dc.departmentKadir Has Universityen_US
dc.department-tempRasmi H., Department of Computer Engineering, Dezful Branch, Islamic Azad University, Dezful, Iran; Mosleh M., Department of Computer Engineering, Dezful Branch, Islamic Azad University, Dezful, Iran; Navimipour N.J., Department of Computer Engineering, Faculty of Engineering and Natural Sciences, Kadir Has University, Istanbul, Turkey; Kheyrandish M., Department of Computer Engineering, Dezful Branch, Islamic Azad University, Dezful, Iranen_US
dc.description.abstractToday, Complementary Metal-OxideSemiconductor (CMOS) technology faces critical challenges, such as power consumption and current leakage at the nanoscale. Therefore, Atomic Silicon Dangling Bond (ASDB) technology has been proposed as one of the best candidates to replace CMOS technology; due to its high-speed switching and low power consumption. Among the most important issues in ASDB nanotechnology, output stability and robustness against possible faults may be focused. This paper first introduces a novel P-shaped pattern in ASDB, for designing stable and robust primitive logic gates, including AND, NAND, OR, NOR and XOR. Then, two combinational circuits, half-subtractor and full-subtractor, are proposed by the proposed ASDB gates. The simulation results show high output stability as well as adequate robustness, against various defects obtained by the proposed designs; on average, they have improvements of more than 56% and 62%, against DB omission defects and extra cell deposition defects; respectively. Also, the results of the investigations show that the proposed circuits have been improved by 65%, 21% and 2%, in terms of occupied area, energy and occurrence, respectively; compared to the previous works. IEEEen_US
dc.identifier.citation0
dc.identifier.doi10.1109/TNANO.2024.3398560
dc.identifier.endpage9en_US
dc.identifier.issn1536-125X
dc.identifier.scopus2-s2.0-85192983375
dc.identifier.scopusqualityQ2
dc.identifier.startpage1en_US
dc.identifier.urihttps://doi.org/10.1109/TNANO.2024.3398560
dc.identifier.urihttps://hdl.handle.net/20.500.12469/5884
dc.identifier.wosqualityQ2
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.relation.ispartofIEEE Transactions on Nanotechnologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAtomic Silicon Dangling Bonds (ASDB)en_US
dc.subjectCircuit stabilityen_US
dc.subjectCircuitsen_US
dc.subjectCMOen_US
dc.subjectEnginesen_US
dc.subjectFullsubtractoren_US
dc.subjectHalf-subtractoren_US
dc.subjectLayouten_US
dc.subjectLogic gatesen_US
dc.subjectNanotechnologyen_US
dc.subjectNanotechnologyen_US
dc.subjectSiliconen_US
dc.titleTowards Atomic Scale Quantum Dots in Silicon: An Ultra-Efficient and Robust Subtractor using Proposed P-shaped Patternen_US
dc.typeArticleen_US
dspace.entity.typePublication

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