Towards Atomic Scale Quantum Dots in Silicon: An Ultra-Efficient and Robust Subtractor Using Proposed P-Shaped Pattern

dc.authoridMosleh, Mohammad/0000-0002-0991-1623
dc.authoridRasmi, Hadi/0000-0002-6790-8684
dc.authorscopusid58718414700
dc.authorscopusid55411379000
dc.authorscopusid59125628000
dc.authorscopusid26422242900
dc.authorwosidKheyrandish, Mohammad/AAN-7340-2021
dc.authorwosidMosleh, Mohammad/T-6461-2019
dc.authorwosidRasmi, Hadi/ACE-5487-2022
dc.contributor.authorRasmi, Hadi
dc.contributor.authorMosleh, Mohammad
dc.contributor.authorNavimipour, Nima Jafari
dc.contributor.authorKheyrandish, Mohammad
dc.date.accessioned2024-06-23T21:39:28Z
dc.date.available2024-06-23T21:39:28Z
dc.date.issued2024
dc.departmentKadir Has Universityen_US
dc.department-temp[Rasmi, Hadi; Mosleh, Mohammad; Kheyrandish, Mohammad] Islamic Azad Univ, Dept Comp Engn, Dezful Branch, Dezful 313, Iran; [Navimipour, Nima Jafari] Kadir Has Univ, Fac Engn & Nat Sci, Dept Comp Engn, TR-34083 Istanbul, Turkiye; [Navimipour, Nima Jafari] Natl Yunlin Univ Sci & Technol, Future Technol Res Ctr, Touliu 64002, Yunlin, Taiwan; [Navimipour, Nima Jafari] Western Caspian Univ, Res Ctr High Technol & Innovat Engn, Baku, Azerbaijanen_US
dc.descriptionMosleh, Mohammad/0000-0002-0991-1623; Rasmi, Hadi/0000-0002-6790-8684en_US
dc.description.abstractToday, Complementary Metal-Oxide-Semiconductor (CMOS) technology faces critical challenges, such as power consumption and current leakage at the nanoscale. Therefore, Atomic Silicon Dangling Bond (ASDB) technology has been proposed as one of the best candidates to replace CMOS technology; due to its high-speed switching and low power consumption. Among the most important issues in ASDB nanotechnology, output stability and robustness against possible faults may be focused. This paper first introduces a novel P-shaped pattern in ASDB, for designing stable and robust primitive logic gates, including AND, NAND, OR, NOR and XOR. Then, two combinational circuits, half-subtractor and full-subtractor, are proposed by the proposed ASDB gates. The simulation results show high output stability as well as adequate robustness, against various defects obtained by the proposed designs; on average, they have improvements of more than 56% and 62%, against DB omission defects and extra cell deposition defects; respectively. Also, the results of the investigations show that the proposed circuits have been improved by 65%, 21% and 2%, in terms of occupied area, energy and occurrence, respectively; compared to the previous works.en_US
dc.description.woscitationindexScience Citation Index Expanded
dc.identifier.citation0
dc.identifier.doi10.1109/TNANO.2024.3398560
dc.identifier.endpage489en_US
dc.identifier.issn1536-125X
dc.identifier.issn1941-0085
dc.identifier.scopus2-s2.0-85192983375
dc.identifier.scopusqualityQ2
dc.identifier.startpage482en_US
dc.identifier.urihttps://doi.org/10.1109/TNANO.2024.3398560
dc.identifier.volume23en_US
dc.identifier.wosWOS:001256383700002
dc.identifier.wosqualityQ3
dc.language.isoenen_US
dc.publisherIeee-inst Electrical Electronics Engineers incen_US
dc.relation.ispartofIEEE Transactions on Nanotechnologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectLogic gatesen_US
dc.subjectCircuitsen_US
dc.subjectSiliconen_US
dc.subjectNanotechnologyen_US
dc.subjectLayouten_US
dc.subjectEnginesen_US
dc.subjectCircuit stabilityen_US
dc.subjecthalf-subtractoren_US
dc.subjectfull-subtractoren_US
dc.subjectatomic silicon dangling bonds (ASDB)en_US
dc.subjectCMOSen_US
dc.titleTowards Atomic Scale Quantum Dots in Silicon: An Ultra-Efficient and Robust Subtractor Using Proposed P-Shaped Patternen_US
dc.typeArticleen_US
dspace.entity.typePublication

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